Enhancement of Luminance Characteristics in Top-Emission Organic Light Emitting Diode with Cr/Al/Cr Anodes

概要

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Top-emission organic light-emitting diodes (TEOLEDs) using chromium anode have been fabricated by employing two techniques: direct-current magnetron sputtering and e-beam evaporation. Atomic force microscopy and work function taken on the chromium film surfaces obtained from both techniques revealed that using dc magnetron sputtering is advantageous over e-beam evaporation in terms of surface characteristics particularly when the film is deposited. The anode having a triple-layer structure of Cr/Al/Cr was deposited on a Si wafer. The device structure of the TEOLED was Cr (20 nm)/Al (100 nm)/Cr (20 nm)/$\alpha$-napthylphenylbiphenyl diamine (NPB) (60 nm)/tris(8-hydroxyquinoline) aluminum (Alq3) (60 nm)/LiF (1 nm)/Al (2 nm)/Ag (20 nm)/NPB (200 nm). The TEOLED containing the Cr layer deposited by dc magnetron sputtering method showed higher luminance and efficiency than that containing the Cr layer deposited by e-beam evaporation. The superior device characteristics of the TEOLED containing the chromium layer deposited by dc magnetron sputtering have been investigated.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2007-06-15