Growth of InGaSb Quantum Dot Structures on GaAs and Silicon Substrates
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概要
- 論文の詳細を見る
We present a growth technique for InGaSb quantum dots (QDs) as Sb-based QD structures on GaAs and silicon substrates by molecular beam epitaxy. We successfully fabricated high-quality and high-density (${>}10^{10}$/cm2) Sb-based QD structures on both substrates by optimizing growth conditions. Additionally, using the Sb-based QDs embedded in a GaAs matrix as an active medium, we demonstrated optical emissions at a wavelength of 1.55-μm from the Sb-based QDs in an optical microcavity structure fabricated on the GaAs substrate. We also discuss the growth of the Sb-based QDs on a silicon wafer that may become useful materials for silicon photonics technology.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-04-30
著者
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OHTANI Naoki
Doshisha University
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Tsuchiya Masahiro
Advanced Communications Technology Group, National Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Akahane Kouichi
Advanced Communications Technology Group, National Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Gozu Shin-ichirou
Advanced Communications Technology Group, National Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Yamamoto Naokatsu
Advanced Communications Technology Group, National Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Ueta Akio
Advanced Communications Technology Group, National Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
関連論文
- Circular Polarization Control in Silicon-Based All-Optical Switch
- Fabrication of Sb-based QDs for long-wavelength VCSELs
- Interface states of AlSb/InAs heterointerface with AlAs-like interface
- Selective Formation of Self-Organized InAs QDs on Patterned GaAs Substrates by Molecular Beam Epitaxy
- 1.55-μm-waveband lasing operation of Sb-based quantum-dot vertical-cavity surface-emitting lasers (Sb-based QD-VCSELs) fabricated on GaAs substrate
- Growth of InAsSb Quantum Dots on GaAs Substrates Using Periodic Supply Epitaxy
- Circular Polarization Control in Silicon-Based All-Optical Switch
- 1.55-μm-Waveband Emissions from Sb-Based Quantum-Dot Vertical-Cavity Surface-Emitting Laser Structures Fabricated on GaAs Substrate
- Growth of InGaSb Quantum Dot Structures on GaAs and Silicon Substrates
- Interface States of AlSb/InAs Heterointerface with AlAs-Like Interface
- Optical Cavity Properties of Metal Mirror Microcavities with InAsSb Quantum Dots