Thin-Film Deposition of Metal Oxides by Aerosol-Assisted Chemical Vapour Deposition: Evaluation of Film Crystallinity

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概要

• 論文の詳細を見る

• Sn-doped In2O3 (ITO) thin films are deposited on glass substrates using 0.2 M aqueous and methanol solutions of InCl3(4H2O) with 5 mol % SnCl2(2H2O) by aerosol-assisted chemical vapour deposition under positive and negative temperature gradient conditions. The film crystallinity is evaluated by determining the film thickness dependence of X-ray diffraction peak height. When using aqueous solution, the ITO films grow with the same crystallinity during the deposition, but when using methanol solution, the preferred orientation of ITO changes during the deposition.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2007-12-15

著者

• Maki Kunisuke

  Graduate School Of Integrated Science Yokohama City University

• Maki Kunisuke

  Graduate School of Integrated Science, Yokohama City University, Yokohama 236-0027, Japan

• Takeuchi Masahiro

  Graduate School of Integrated Science, Yokohama City University, Yokohama 236-0027, Japan

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• Thin-Film Deposition of Metal Oxides by Aerosol-Assisted Chemical Vapour Deposition: Evaluation of Film Crystallinity
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