Structural and Optical Characterization of Semiconducting TiN Nanoparticles Thin Film

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概要

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• We have succeeded in fabricating a thin film consisting of semiconducing TiN nanoparticles soft-landed on a substrate at room temperature using N2 reactive magnetron sputtering combined with a gas aggregation method. The total film thickness is about 1200 nm. Under the optimized experimental parameters for controlling the growth of TiN particles, the average diameter of TiN nanoparticles is 2.54 nm and their diameter distribution is from 1.1 to 3.8 nm. X-ray photoelectron spectroscopy (XPS) study reveals that the fabricated semiconducting TiN has N vacancies and/or defects as TixN1-x. The average lattice constant of the TiN particulates is estimated as 4.216 Å and contracted by 0.6% from that of bulk TiN, which is presumably caused by the vacancies and/or defects. Spectroscopic ellipsometry (SE) study revealed that the imaginary part of the dielectric constant of the present film shows typical semiconducting behavior and gives the optical band gap of the film as 3.65 eV in direct allowed optical transition mode.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2007-01-15

著者

• Tanemura Sakae

  Japan Fine Ceramics Centre

• Toh Shoichi

  Department Of Material Science And Engineering And Hvem Lab. Kyushu University

• Mori Yukimasa

  Materials Research Laboratory Ngk Insulators Ltd.

• Tanemura Masaki

  Department Of Environmental Technology Graduate School Of Engineering Nagoya Institute Of Technology

• Kajino Yoichi

  Department Of Environmental Technology Graduate School Of Engineering Nagoya Institute Of Technology

• Kaneko Kenji

  Department Of Applied Bio-sciences Faculty Of Agriculture Tohoku University

• Miao Lei

  Department of Environmental Technology, Graduate School of Engineering, Nagoya Institute of Technology, Showa-ku, Nagoya 466-8555, Japan

• Miao Lei

  Department of Environmental Technology & Urban Planning, Nagoya Institute of Technology, Gokisho-cho, Showa-ku, Nagoya 466-8555, Japan

• Kajino Yoichi

  Department of Environmental Technology, Graduate School of Engineering, Nagoya Institute of Technology, Showa-ku, Nagoya 466-8555, Japan

• Tanemura Sakae

  Japan Fine Ceramics Centre, 2-4-1 Mutsuuno, Atsuta-ku, Nagoya 456-8567, Japan

• Toh Shoichi

  Department of Material Science and Engineering and HVEM Lab., Kyushu University, Higashi-ku, Fukuoka 812-8581, Japan

• Tanemura Masaki

  Department of Environmental Technology, Graduate School of Engineering, Nagoya Institute of Technology, Showa-ku, Nagoya 466-8555, Japan

• Tanemura Masaki

  Department of Environmental Technology & Urban Planning, Nagoya Institute of Technology, Gokisho-cho, Showa-ku, Nagoya 466-8555, Japan

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