Microcrystalline Silicon Solar Cells Fabricated using Array-Antenna-Type Very High Frequency Plasma-Enhanced Chemical Vapor Deposition System
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概要
- 論文の詳細を見る
An array-antenna-type very high frequency plasma-enhanced chemical vapor deposition (VHF-PECVD) system based on a multisubstrate deposition technique has been developed for the large area (${>}1$ m2), high-throughput and low-cost production of thin-film silicon solar cells. A hydrogenated microcrystalline silicon ($ \mu $c-Si:H) solar cell fabricated at around 20 Pa showed an initial efficiency of 7.44% for a deposition rate of 0.32 nm/s with evaporated Ag as the back contact. The uniform formation of each layer was observed, and the quantum efficiency spectrum after exposure to air indicates high-stability high-quality film formation. The advantage of the novel array antenna method is discussed in terms of the material property as well as production cost.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-05-15
著者
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Takagi Tomoko
Department Of Bioscience And Biotechnology Faculty Of Agriculture Shinshu University
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Kondo Michio
Department Of Chemistry Faculty Of Science And Ehgineering Saga University
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Takagi Tomoko
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuda, Midori-ku, Yokohama 226-8503, Japan
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Ueda Masashi
Photovoltaic Engineering Group, High Energy System Department, Ishikawajima-Harima Heavy Industries Co., Ltd., 1 Shin-Nakahara-cho, Isogo-ku, Yokohama 235-8501, Japan
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Ito Norikazu
Photovoltaic Engineering Group, High Energy System Department, Ishikawajima-Harima Heavy Industries Co., Ltd., 1 Shin-Nakahara-cho, Isogo-ku, Yokohama 235-8501, Japan
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Watabe Yoshimi
Photovoltaic Engineering Group, High Energy System Department, Ishikawajima-Harima Heavy Industries Co., Ltd., 1 Shin-Nakahara-cho, Isogo-ku, Yokohama 235-8501, Japan
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Kondo Michio
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuda, Midori-ku, Yokohama 226-8503, Japan
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