Epitaxial Growth of Cr Ultrathin Films on Vicinal and Low Index Mo(110) Surfaces

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概要

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• The growth of ultrathin Cr films in the $0.15 \le \theta \le 4.6$ ML coverage range on both vicinal and low index Mo(110) surfaces is studied at substrate temperatures between 400 and 600 K. The films grow pseudomorphically on both substrates by the step flow growth mechanism up to a coverage of at least 2.4 ML. Above this coverage, the films undergo a transition to Stranski–Krastanov growth. The transition is accompanied by strain release through the formation of a two dimensional dislocation network.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2006-03-15

著者

• Murphy S.

  SFI Nanoscience Laboratory, Physics Department, Trinity College, Dublin 2, Ireland

• Cazacu A.

  SFI Nanoscience Laboratory, Physics Department, Trinity College, Dublin 2, Ireland

• Shvets I.

  SFI Nanoscience Laboratory, Physics Department, Trinity College, Dublin 2, Ireland

関連論文

• Epitaxial Growth of Cr Ultrathin Films on Vicinal and Low Index Mo(110) Surfaces

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