Nanolithography Based on Photocatalysis of TiO2 Using an Atomic Force Microscope
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概要
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Stearic-acid films have been deposited on single-crystalline TiO2(110) substrates by vacuum evaporation. No changes are seen in atomic-force microscope (AFM) topographic images of the stearic-acid films after a scan at a bias voltage of $-10$ to 10 V in the dark. Similarly, ultraviolet irradiation at bias voltage $<$ 0.0 V brings about no changes in the AFM topographic images. In contrast, a rectangular hole with a size of $200\,\text{nm}\times 200\,\text{nm}$ is formed in the stearic-acid film after a scan at 10 V under ultraviolet irradiation. No current flows on the stearic-acid film, whereas an appreciable current flows at $-2.0$ V at the rectangular hole. Photocatalytic decomposition of the stearic-acid films deposited on the TiO2(110) substrates occurs at the area in which a bias voltage of 10 V is applied. The letters "YT" with a line width of 30 nm are drawn in the stearic-acid film by AFM-based photocatalysis.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-15
著者
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TOMITA Yasumasa
Department of Chemistriy, Faculty of Sciecne, Hiroshima University
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Kobayashi Kenkichiro
Department Of Applied Chemistry Faculty Of Engineering Ehime University
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Tomita Yasumasa
Department of Materials Science, Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan
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Maeda Yasuhiha
Department of Materials Science, Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan
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Kobayashi Kenkichiro
Department of Materials Science, Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan
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