Aerosol Plasma Deposition Method for Preparation of Lead Zirconate Titanate Thick Films
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概要
- 論文の詳細を見る
Lead zirconate titanate (PZT) thick films were grown by a novel aerosol plasma deposition (APD) method, which combines aerosol deposition (AD) and low-temperature microwave plasma. In our set-up, the deposition rate used in the APD method was about one order of magnitude higher than that in the AD method, which can be attributed to the charging and decomposition effects of the plasma on moving agglomerates to form a trapped jet. While an as-grown APD film deposited at 200°C with a thickness of ${\sim}10$ μm showed no ferroelectric hysteresis loop, a PZT film annealed at 600°C showed a remanent polarization of ${\sim}26$ μC/cm2 and a coercive field of ${\sim}110$ kV/cm.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2005-05-15
著者
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Wang Sea-fue
Department Of Materials And Mineral Engineering National Taipei University Of Technology
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CHANG Chih-Shiang
Materials Research Laboratories, Industrial Technology Research Institute
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Lin Tzer-sheng
Materials Research Laboratories Industrial Technology Research Institute
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Peng Cheng-jien
Materials Research Laboratories Industrial Technology Research Institute
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Wang Shih-chieh
Department Of Materials And Minerals Engineering National Taipei University Of Technology
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Peng Cheng-Jien
Materials Research Laboratories, Industrial Technology Research Institute, 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu 310, Taiwan, R.O.C.
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Lin Tzer-Sheng
Materials Research Laboratories, Industrial Technology Research Institute, 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu 310, Taiwan, R.O.C.
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Wang Shih-Chieh
Department of Materials and Minerals Engineering, National Taipei University of Technology, 1, Sec. 3, Chung-Hsiao E. Rd., Taipei 106, Taiwan, R.O.C.
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Chang Chih-Shiang
Materials Research Laboratories, Industrial Technology Research Institute, 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu 310, Taiwan, R.O.C.
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