In-situ Optical Spectroscopy of Ablation Plume for Preparations of Nanostructured TiO2 Thin Films by Pulsed Laser Deposition

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概要

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• Nanostructured TiO2 thin films on $\alpha$-Al2O3 (0001) substrates prepared by pulsed laser deposition (PLD) were analyzed and evaluated in terms of the buffer O2 gas pressure (0–80 Pa) dependencies by optical spectroscopy and surface morphology. Optical emission spectra of the ablation plume from Ti and TiO2 targets were measured in-situ. The contribution from TiO molecules was observed by narrow-band photometry. The surface morphology was observed by an atomic force microscope (AFM), revealing the pressure dependence of nanostructures. The crystalline structures of prepared TiO2 thin films were observed by X-ray diffraction (XRD). The optically observed band-gaps of the prepared thin films show that the crystal structures are mixed crystals of rutile and anatase. Evaporated Ti particles combine with buffer O2 gas thereby producing TiO molecules, which affect the formation of nanostructures on TiO2 thin films.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-09-15

著者

• Kitazawa Sin-iti

  Department of Materials Science, Japan Atomic Energy Research Institute (JAERI), Shirakata Shirane 2-4, Tokai, Naka, Ibaraki 319-1195, Japan

関連論文

• In-situ Optical Spectroscopy of Ablation Plume for Preparations of Nanostructured TiO2 Thin Films by Pulsed Laser Deposition

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