Shape Transition in the Initial Growth of Titanium Silicide Clusters on Si(111)
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概要
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The growth of titanium silicide clusters has been observed for sub-monolayer Ti deposited on Si(111)-$7\times 7$. Irregular shape tetragonal Ti5Si4 islands were observed to grow at 600°C. On the other hand, the elongated orthorhombic-Ti5Si4 (O-Ti5Si$_{4})$ clusters form at 700°C. The clusters underwent a rapid increase in length and slight reduction in width as the cluster area exceeds a critical size (${\sim}15$ nm$^{2})$. The elongated clusters are oriented along three equivalent Si$\langle \text{2-20}\rangle$ directions of the Si(111) surface with O-Ti5Si4 (025)$\parallel$Si(2-20). The shape change is in agreement with theoretical prediction based on the strain relief mechanism.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-07-15
著者
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Chiang T.
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 300, Taiwan, Republic of China
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Chen L.
Department of Applied Chemistry Faculty of Engineering The University of Tokyo
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Hsu H.
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 300, Taiwan, Republic of China
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