Analyses of Alignment Measurement Error

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概要

• 論文の詳細を見る

• In the progress of ULSI, alignment technology must have a high accuracy in all processes, even if the alignment mark is asymmetric and/or with a low step height. To satisfy such requirements, the alignment measurement errors and the pattern shape are studied and analyzed mathematically. In order to obtain a solution for these errors, our developed alignment technique, focus optimization of a field image alignment sensor (FFO), is studied and analyzed. The phase shift of diffraction rays obtained by FFO removes the image distortion caused by the asymmetrical distribution of the diffraction rays, and realizes alignment with a high accuracy. These analyses lead to a deep understanding of the alignment measurement errors and FFO effects. The advantages of FFO for future-generation ULSI production are confirmed.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-06-15

著者

• SUGAYA Ayako

  1st Research Group, Optical Technology Development Department, Optical Technology Headquarters, Core

• Sugaya Ayako

  1st Research Group, Optical Technology Development Department, Optical Technology Headquarters, Core Technology Center, Nikon Corporation, 6-3 Nishi-Ohi 1-chome, Shinagawa-ku, Tokyo 140-8601, Japan

関連論文

• Optical Alignment Optimizations for Reducing Wafer-Induced Shift
• Optical Alignment Optimizations for Reducing Wafer-Induced Shift
• Analyses of Alignment Measurement Error

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