High-Sensitive Ultrathin Negative Electron Beam Resist Based on Langmuir-Blodgett Films of Polycyanoacrylate
スポンサーリンク
概要
- 論文の詳細を見る
We carried out an electron-beam lithography study of the sub-μm performances of Langmuir-Blodgett films of Polycyanoacrylates fabricated by the Langmuir-Schaefer technique. We tested the sensitivity of films made by 48 monolayers, finding a dose of less than 1 μC/cm2, and employed them as masks for wet etching of Cr metal layers, with resolutions up to 100 nm. These results suggest that the modified Langmuir-Schaefer technique, and the Polycyanoacrylate-based resists, are very promising for nanotechnology applications.
- 2004-06-15
著者
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Rinaldi Ross
NNL, National Nanotechnology Laboratory of INFM c/o Dipartimento di Ingegneria dell'Innovazione, University of Lecce, via Arnesano, I-73100 Lecce, Italy
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Fontana Marco
INFM and Department of Physics, University of Parma, Viale delle Scienze, I-43100 Parma, Italy
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Della Torre
NNL, National Nanotechnology Laboratory of INFM c/o Dipartimento di Ingegneria dell'Innovazione, University of Lecce, via Arnesano, I-73100 Lecce, Italy
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Pisignano Dario
NNL, National Nanotechnology Laboratory of INFM c/o Dipartimento di Ingegneria dell'Innovazione, University of Lecce, via Arnesano, I-73100 Lecce, Italy
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Berzina Tatiana
INFM and Department of Physics, University of Parma, Viale delle Scienze, I-43100 Parma, Italy
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Erokhin Victor
INFM and Department of Physics, University of Parma, Viale delle Scienze, I-43100 Parma, Italy
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Visconti Paolo
NNL, National Nanotechnology Laboratory of INFM c/o Dipartimento di Ingegneria dell'Innovazione, University of Lecce, via Arnesano, I-73100 Lecce, Italy
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Pisignano Dario
NNL, National Nanotechnology Laboratory of INFM c/o Dipartimento di Ingegneria dell'Innovazione, University of Lecce, via Arnesano, I-73100 Lecce, Italy
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Visconti Paolo
NNL, National Nanotechnology Laboratory of INFM c/o Dipartimento di Ingegneria dell'Innovazione, University of Lecce, via Arnesano, I-73100 Lecce, Italy