Characterizing Optical Constants of Thin Films for Vacuum Ultraviolet Lithography Applications

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概要

• 論文の詳細を見る

• The determination of optical constants of thin films is an important requirement for the study of masks, antireflective coatings, and resist materials used in the vacuum ultraviolet (VUV) lithography process. We demonstrate a simple method for determining optical constants by measuring the reflectance of thin films with different incidence angles. In order to obtain accurate optical constants, the measurement of reflectance, incidence angles and thickness should be confirmed carefully. In addition, thickness measurements are not important for thick high-absorption films. The measured reflectance should be modified by the surface roughness of thin films particularly in vacuum ultraviolet regimes. The optical constants of various materials were obtained experimentally by this method without using complicated mathematics models.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-06-15

著者

• Wu Chi-lung

  Institute Of Engineering And System Science National Tsing Hua University

• FAN Wonder

  National Nano Device Lab.

• Chen Hsuen-Li

  Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University

• Chang-Liao Kuei-Shu

  Institute of Engineering and System Science, National Tsing Hua University, Hsinchu, Taiwan, R.O.C.

• Wu Chi-Lung

  Institute of Engineering and System Science, National Tsing Hua University, Hsinchu, Taiwan, R.O.C.

関連論文

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• Characterizing Optical Constants of Thin Films for Vacuum Ultraviolet Lithography Applications

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