Estimation of Schottky Contacts to Porous Si by Photoacoustic Spectroscopy
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概要
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The photoacoustic (PA) spectra of porous Si (PS) were measured using a microphone under various surface treatments such as vibration during anodisation, vibration during rinsing, and acid surface treatment before contact deposition. The Fourier transform infrared (FTIR) spectra were also compared for the estimation of surface conditions. To obtain good contacts for electroluminescence (EL) devices, where a large injection current during operation is required, the vibration during rinsing in distilled (DI) water and hydrochloric (HCl) acid surface treatment are important. The PA signals increase with such vibration because of the enhancement of the pressure effects in pores of PS. Moreover, the decrease in PA signals caused by the surface change of pores can be also observed with the surface treatments. As the good contacts are obtained both by the vibration and surface treatments, the surface states in the pores seem to be important for the contacts to PS. This process can be monitored by PA spectroscopy in a noncontact manner because the PA signals from the PS are enhanced in the pores by the pressure effects, and PA spectroscopy can be sensitive to the change in surface of pores of PS.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-05-15
著者
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Okamoto Masaki
Department Of Applied And Bioapplied Chemistry Graduate School Of Engineering Osaka City University
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TAHIRA Kenichiro
Department of Electrical and Electronic Engineering, National Defense Academy
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Kawahara Toshio
Department Of Materials Science And Engineering National Defense Academy
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Morimoto Jun
Department Of Applied Physics National Defense Academy
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Funaki Shingo
Department Of Materials Science And Engineering National Defense Academy
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Okamoto Yoichi
Department Of Applied Physics National Defense Academy
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Inoue Yoshihiro
Department Of Critical Care Medicine Iwate Medical University
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Tahira Kenichiro
Department of Electrical and Electronic Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka 239-8686, Japan
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Funaki Shingo
Department of Materials Science and Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka 239-8686, Japan
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Kawahara Toshio
Department of Materials Science and Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka 239-8686, Japan
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INOUE YOSHIHIRO
Department of Anatomy, Okayama University School of Dentistry
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