Transmission Electron Microscopy Observation of Reaction in Nanometer-scaled Au and Si Binary System

概要

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Nano-particles of Au are formed on an amorphous carbon film by 1-nm-thick Au deposition using the rf sputtering method at a substrate temperature of 295 K. Then Si films with thicknesses ranging from 1 nm to 30 nm are deposited at substrate temperatures ($T_{\text{dep}}$) lower than 673 K without breaking the vacuum. The specimens are observed by transmission electron microscopy. It is revealed that the alloying between the Au nano-particles and the Si takes place even at $T_{\text{dep}}=295$ K. As the deposition thickness of Si on the Au nano-particles at $T_{\text{dep}}=473$ K increases from 1 nm to 30 nm, the following sequence of reactions has been observed, i.e., the improvement of crystallinity of Au particles, the alloying by dissolving of Au nano-particles, and the precipitation of nano-crystalline Si. On the other hand, when 1-nm-thick Au is deposited on 15-nm-thick amorphous Si at 295 K, the alloying takes place during the deposition. However, no contrast corresponding to Au nano-particles is observed. In both orders of deposition, no metastable Au–Si compound has been observed.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2004-02-15