Optimum Timing and Position of Light Irradiation for Thermally Assisted Perpendicular Recording
スポンサーリンク
概要
- 論文の詳細を見る
The optimum timing and position of light irradiation on the medium for thermally assisted perpendicular recording were evaluated in terms of read-write characteristics calculated by micromagnetics simulation. It was shown that the light irradiation timing should be optimized for obtaining the maximum head field and temperature simultaneously. Moreover, the irradiation start time and stop time were determined to obtain the optimum light irradiation timing. It was also shown that the distance between the light-spot center and the head trailing edge should be less than the radius of the light-spot size.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-11-15
著者
-
NAKAMURA Atsushi
Research Institute for Information Science and Education, Hiroshima University
-
Igarashi Masukazu
Research & Development Group Hitachi Ltd.
-
MATSUMOTO Takuya
Research Institute for Advanced Science and Technology, Osaka Prefecture University
-
Saga Hideki
Research & Development Group Hitachi Ltd.
-
Akagi Fumiko
Research & Development Group Hitachi Ltd.
-
MOCHIZUKI Masafumi
Research & Development Group, Hitachi, Ltd.
-
Akagi Fumiko
Research & Development Group, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan
-
Ishikawa Kei
Hiramatsu Honcho Utsunomiya-shi, Tochigi 321-0932, Japan
-
Igarashi Masukazu
Research & Development Group, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan
-
Matsumoto Takuya
Research & Development Group, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan
-
Saga Hideki
Research & Development Group, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan
-
Nakamura Atushi
Research & Development Group, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan
-
Mochizuki Masafumi
Research & Development Group, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan
関連論文
- Color Confinement in Coulomb Gauge QCD(Particles and Fields)
- Doping and characterization for ZnO:N films grown by radical induced remote plasma metaloganic chemical vapor deposition
- Electrical and Magnetic Properties of a Single Crystal UCu_2Si_2(Condensed Matter : Electronic Structure, Electrical, Magnetic and Optical Properties)
- Surface Reconstruction of GaP (001) for Various Surface Stoichiometries
- Surface Stoichiometry and Reconstruction of GaP(001)
- Color-Singlet Instantaneous Potential in the Coulomb Gauge QCD(Hot QCD and QGP, Dense hadronic and quark matter, New Frontiers in QCD-Exotic Hadrons and Hadronic Matter-)
- Optimum Timing and Position of Light Irradiation for Thermally Assisted Perpendicular Recording
- Retraction: “Characterization of MgxZn1-xO Films Grown by Remote-Plasma-Enhanced Metalorganic Chemical Vapor-Deposition using bis-Ethylcyclopentadienyl Magnesium”
- Graphite Thin Films Consisting of Nanograins of Multilayer Graphene on Sapphire Substrates Directly Grown by Alcohol Chemical Vapor Deposition
- Dot-Height Dependence of Photoluminescence from ZnO Quantum Dots
- Nonpolar $(11\bar{2}0)$ p-Type Nitrogen-Doped ZnO by Remote-Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Long-Distance Behavior of qq^^- Color Dependent Potentials at Finite Temperature (Particles and Fields)
- Surface Reconstruction of GaP (001) for Various Surface Stoichiometries
- Heavy qq Interaction at Finite Temperature
- Direct Growth Properties of Graphene Layers on Sapphire Substrate by Alcohol-Chemical Vapor Deposition
- Optimum Timing and Position of Light Irradiation for Thermally Assisted Perpendicular Recording
- Optical Properties of Wurtzite Zn1-xCdxO Films Grown by Remote-Plasma-Enhanced Metalorganic Chemical Vapor Deposition