Film Density Dependence of Polymethylmethacrylate Ablation under Synchrotron Radiation Irradiation
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概要
- 論文の詳細を見る
Variations in the etch depth and refractive index of polymethylmethacrylate (PMMA) films of different molecular weights after synchrotron radiation (SR) irradiation are investigated. Reduction of the PMMA film molecular weight, density and thickness are observed after SR irradiation. The amount of film thickness loss depends on not only initial molecular weight but also film density. The PMMA density difference at the start of SR exposure affects the etch depth after SR ablation.
- 2001-02-15
著者
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Choi Jae-young
Pohang Accelerator Laboratory Postech
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Hattori Reiji
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Hidaka Masanori
Department Of Physics Faculty Of Science Kyushu University
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Kuroki Yukinori
Department Of Electronic Device Engineering Kyushu University
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Ikeda Akihiro
Department Of Neurosurgery Saitama Medical School Hospital
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CHANG Suk
Pohang Accelerator Laboratory, POSTECH
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HISAKADO Tohru
Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu
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HAKIAI Yousuke
Department of Physics, Graduate School of Science, Kyushu University
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Fujimura Tsuyoshi
Department Of Electronics Graduate School Of Information Science And Electrical Engineering Kyushu U
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Ikeda Akihiro
Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 812-8581, Japan
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Chang Suk
Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang, Gyeongbuk 790-784, Korea
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Hisakado Tohru
Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 812-8581, Japan
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Hidaka Masanori
Department of Physics, Graduate School of Science, Kyushu University, Fukuoka 812-8581, Japan
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Hakiai Yousuke
Department of Physics, Graduate School of Science, Kyushu University, Fukuoka 812-8581, Japan
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