Analysis of Mechanisms for Hot-Carrier-Induced VLSI Circuit Degradation
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概要
- 論文の詳細を見る
In this paper we discuss in detail the mechanism for hot-carrier induced circuit degradation in actual 64Mb DRAM (dynamic random access memory), by investigating the DRAM specification parameter shift due to transistor aging in each of the constituent circuits. It was found that hot-carrier induced transistor aging of the circuit block does not directly affect the internal clock speed degradation, however, it does greatly reduces the design margin of a circuit which suffers from heavy loads. In addition, an in-depth study of the dynamic hot-carrier degradation behavior of N-channel transistors more common in actual VLSI circuits was carried out based on the alternating stress and charge pumping techniques.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1996-02-28
著者
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Yang Dooyoung
Ulsi Laboratory Lg Semicon Co. Ltd.
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Huh Yoonjong
Ulsi Laboratory Lg Semicon Co. Ltd.
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Sung Yungkwon
Korea University Electrical Engineering Dept.
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l'Yee Hyeokjae
ULSI Laboratory, LG Semicon, Co., Ltd., 1 Hyangjeong-Dong, Heungdeok-Gu, Cheongju 360-480, Korea
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Huh Yoonjong
ULSI Laboratory, LG Semicon, Co., Ltd., 1 Hyangjeong-Dong, Heungdeok-Gu, Cheongju 360-480, Korea
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Sung Yungkwon
Korea University, Electrical Engineering Dept. 1, Anam-Dong, Sungbuk-Gu, Seoul 136, Korea
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Yang Dooyoung
ULSI Laboratory, LG Semicon, Co., Ltd., 1 Hyangjeong-Dong, Heungdeok-Gu, Cheongju 360-480, Korea
関連論文
- Electrical Characteristics of Ultra Short Channel CMOS Device for Giga-bit DRAM Applications
- Analysis of Mechanisms for Hot-Carrier-Induced VLSI Circuit Degradation
- Analysis of Mechanisms for Hot-Carrier-Induced VLSI Circuit Degradation