Compound-Layer-Free Nitriding of Ferrous Metals Using Electron-Beam-Excited Nitrogen Plasma
スポンサーリンク
概要
- 論文の詳細を見る
The nitriding of ferrous metals is primarily carried out to improve the surface hardness resulting from the formation of nitrogen compounds and diffused atomic nitrogen. In this study, we detail the achievements of the compound-layer-free nitriding of ferrous metallic surfaces using a low-power electron-beam-excited plasma in a nitrogen atmosphere. The X-ray diffraction and hardness results of our experiments indicate that the nitride layer consisting of CrN, Fe4N, and Fe3N compounds is drastically reduced when driving the system at 100 eV, while it maintains a hardness about 1.5 times that of the untreated surface. We have also confirmed that the present process can be applied to the nitriding of mechanical parts with narrow slit features.
- Japan Society of Applied Physicsの論文
- 2007-11-25
著者
-
Hara Tamio
Toyota Technological Inst. Nagoya Jpn
-
Abraha Petros
Meijo Univ. Nagoya Jpn
-
Hara Yasuhiro
Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
-
Yoshikawa Yasuharu
Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
-
Hara Tamio
Toyota Technological Institute, 2-12-1 Hisakata, Tempaku-ku, Nagoya 468-8511, Japan
-
Abraha Petros
Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
関連論文
- Dotted-Array Plasma Production by Using a Line-Focusing Lens System with Segmented Prism Array for Compact X-ray Laser Experiments
- Demonstration of X-Ray Amplification in an X-Ray Laser Cavity Pumped by a Pulse-Train Yttrium Aluminium Garnet Laser
- Debris from High-Aspect-Ratio Rectangular Focused Laser Irradiation on a Tape Target Surface in an X-Ray Laser System
- Observation of Gain and Double-pass Amplification of Li-like Al Soft X-ray Transitions in a Recombining Plasma Pumped by a Pulse-train YAG Laser
- Effect of Multipulse Waveform on Gains of Soft X-Ray Lines of Lithium-Like Aluminum Ions in Recombining Plasmas
- Self-Aligned Formation of Porous Silicon Membranes Using Si Diaphragm Structures : Instrumentation, Measurement, and Fabrication Technology
- Growth Rate and Crystallinity of Nanocrystalline Silicon Film Grown by Electron Beam Excited Plasma Chemical Vapor Deposition
- High Degree of Dissociation of Nitrogen Molecules in Large-Volume Electron-Beam-Excited Plasma
- Development of neutral beam source using electron beam excited plasma
- Contactless Measurement of Young’s Modulus Using Laser Beam Excitation and Detection of Vibration of Thin-Film Microresonators
- Compound-Layer-Free Nitriding of Ferrous Metals Using Electron-Beam-Excited Nitrogen Plasma
- Debris from the Target of an X-Ray Laser System and the Effect on Cavity Mirrors
- Measurements of Spatial Coherence of Recombination X-Ray Laser
- Improvement of Compact Electron-Beam-Excited Plasma Source for Increased Producible Plasma Density