Periodically Aligned Submicron Dots of Silicon and Nickel Fabricated by Irradiation with Linearly Polarized Nd:YAG Pulsed Laser

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概要

• 論文の詳細を見る

• Periodic arrays of submicron Si and Ni dots were fabricated by only irradiating a linearly polarized Nd:YAG pulsed laser to Si and Ni thin films deposited on a silicon dioxide (SiO2) film. The molten film was split and it condensed owing to its surface tensile according to the laser-induced periodic energy density distribution, and fine lines (line and space structures) of Si and Ni were formed periodically. After the formation of fine lines, the sample was rotated by 90°, and irradiated with the laser beam. Periodically aligned submicron Si and Ni dots were fabricated on the SiO2 film.

• Japan Society of Applied Physicsの論文
• 2007-06-25

著者

• Nishioka Kensuke

  Graduate School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan

• Horita Susumu

  Graduate School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan

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• Periodically Aligned Submicron Lines of Silicon and Nickel Fabricated using Linearly Polarized Nd:YAG Pulse Laser
• Periodically Aligned Submicron Dots of Silicon and Nickel Fabricated by Irradiation with Linearly Polarized Nd:YAG Pulsed Laser

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