Limitations in Through-Focus Depth Sectioning in Non-Aberration Corrected High-Angle Annular Dark-Field Imaging
スポンサーリンク
概要
- 論文の詳細を見る
The focus dependence of atom column intensities in high-angle annular dark-field (HAADF) images is investigated as a function of sample thickness for two different materials, InP and SrTiO3. We show that even for very thick samples, the column intensities in both materials are maximized if the probe is focused near the entrance sample surface. Atom column intensities decrease for focus settings away from the optimum focus. The results show that HAADF through-focus series with a non-aberration corrected probe do not allow for atomically resolved depth sectioning in zone-axis crystals.
- Japan Society of Applied Physicsの論文
- 2006-06-25
著者
-
Klenov Dmitri
Materials Department University Of California
-
Stemmer Susanne
Materials Department University Of California
-
Stemmer Susanne
Materials Department, University of California, Santa Barbara, CA 93106-5050, U.S.A.
関連論文
- Thickness Dependence of the Dielectric Properties of Epitaxial SrTiO3 Films on (001)Pt/SrTiO3
- Application of Metastable Phase Diagrams to Silicate Thin Films for Alternative Gate Dielectrics
- Epitaxial SrTiO3 Tunnel Barriers on Pt/MgO Substrates
- The Interface between Single Crystalline (001) LaAlO3 and (001) Silicon
- Limitations in Through-Focus Depth Sectioning in Non-Aberration Corrected High-Angle Annular Dark-Field Imaging