Production of Liquid Cluster Ions for Surface Treatment

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概要

• 論文の詳細を見る

• We have developed a cluster ion beam system using organic liquid materials, which has several advantages for surface etching and chemical modification based on the different properties of liquid cluster ions. By utilizing the system, ethanol vapor was ejected through a nozzle into a high-vacuum region, and ethanol clusters were produced by an adiabatic expansion phenomenon. The clusters were ionized by an electron bombardment method, and cluster ions were accelerated toward a substrate by applying an acceleration voltage. Silicon substrates were irradiated at different acceleration voltages with ethanol cluster ion beams, and chemical sputtering of the substrate surface was achieved even at an acceleration voltage of a few kV. In addition, the sputtering yield at an acceleration voltage of 9 kV was approximately 100 times larger than that by argon ion beams, and the sputtered surface had an average roughness of less than 1 nm. Thus, ethanol cluster ion beams have unique characteristics suitable for surface treatment, such as high sputtering yield and smooth surface at an atomic level.

• Japan Society of Applied Physicsの論文
• 2003-08-15

著者

• Takaoka Gikan

  Ion Beam Engineering Experimental Laboratory Kyoto University

• Seki Toshio

  Ion Beam Engineering Experimental Laboratory Kyoto University

• Yamamoto Tomoaki

  Ion Beam Engineering Experimental Laboratory Kyoto University

• NOGUCHI Hidetaka

  Ion Beam Engineering Experimental Laboratory, Kyoto University

• Takaoka Gikan

  Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606-8501, Japan

• Seki Toshio

  Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606-8501, Japan

• Noguchi Hidetaka

  Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606-8501, Japan

• Yamamoto Tomoaki

  Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606-8501, Japan

関連論文

• Ionized Cluster Beams : Physics and Technology
• Effects on CO Oxidation Activity of Nano-Scale Au Islands and TiO_2 Support Prepared by the Ionized Cluster Beam Method
• Epitaxial Growth of TiO_2 Rutile Thin Films on Sapphire Substrates by a Reactive Ionized Cluster Beam Method
• Interaction of SF_6 Cluster Ion Beams with Si Surface : Surfaces, Interfaces, and Films
• Production of Liquid Cluster Ions for Surface Treatment
• Development of Liquid Polyatomic Ion Beam System for Surface Modification : Instrumentation, Measurement, and Fabrication Technology
• Production of Liquid Cluster Ions for Surface Treatment

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