Observation of Hydrogenated Silicon Clusters Si6Hx with Controlled Hydrogen Content on Si (111)-($7\times 7$) Surfaces
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概要
- 論文の詳細を見る
We studied how Si6Hx clusters behave on Si (111)-($7\times 7$) surfaces depending on hydrogen content $x$ by scanning tunneling microscopy. The Si6H$_{x}^{+}$ ions were synthesized in an ion trap and deposited onto the ($7\times 7$) surfaces with an impact kinetic energy of 3 eV, i.e., 0.5 eV/Si atom, without decomposition. Deposited Si6H10–13 clusters favorably adsorbed on faulted halves of the ($7\times 7$) surfaces while Si6H0–5 clusters were randomly distributed. A clear difference of the electronic structure between Si6H0–5 and Si6H10–13 clusters was found in the tunneling spectra of the clusters.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-02-15
著者
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Bolotov Leonid
Mirai Project Advanced Semiconductor Research Center National Institute Of Advanced Industrial Scien
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Uchida Noriyuki
Mirai Project Advanced Semiconductor Research Center National Institute Of Advanced Industrial Scien
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Kanayama Toshihiko
Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
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Uchida Noriyuki
MIRAI Project, Advanced Semiconductor Research Center, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562, Japan
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Bolotov Leonid
MIRAI Project, Advanced Semiconductor Research Center, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562, Japan
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Kanayama Toshihiko
MIRAI Project, Advanced Semiconductor Research Center, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562, Japan
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- Observation of Hydrogenated Silicon Clusters Si6Hx with Controlled Hydrogen Content on Si (111)-($7\times 7$) Surfaces