Depth Profiling of Si Oxidation States in Si-Implanted SiO2 Films by X-Ray Photoelectron Spectroscopy
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概要
- 論文の詳細を見る
Thin SiO2 films containing Si nanocrystals (nc-Si) prepared by low-energy Si ion implantation and high-temperature annealing, which are used in the application of single-electron memory devices, are studied by X-ray photoelectron spectroscopy (XPS). XPS analysis shows the existence of five Si oxidation states Sin+ ($n$ =0, 1, 2, 3, and 4) in the SiO2 films, indicating that not all of the implanted Si atoms are converted to nanocrystals during annealing and some of them form Si suboxides corresponding to the three oxidation states Sin+ ($n$ =1, 2 and 3). The relative concentration of each oxidation state at various depths is determined quantitatively by XPS analysis. In addition, the effects of annealing on both the oxidation states and their depth distributions are also studied.
- Japan Society of Applied Physicsの論文
- 2003-11-15
著者
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Liu Yang
School Of Electrical And Electronic Engineering Nanyang Technological University
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HSIEH Jang-Hsing
School of Mechanical and Production Engineering, Nanyang Technological University
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Tse Man
School Of Electrical And Electronic Engineering Nanyang Technological University
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Chen Tu
School Of Electrical And Electronic Engineering Nanyang Technological University
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Fu Yong
School Of Mechanical And Production Engineering Nanyang Technological University
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Yang Xiao
School Of Electrical And Electronic Engineering Nanyang Technological University
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Fung Steve
Department Of Physics The University Of Hong Kong
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Yang Xiao
School of Electrical and Electronic Engineering, Nanyang Technological University, 639798 Singapore
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Tse Man
School of Electrical and Electronic Engineering, Nanyang Technological University, 639798 Singapore
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Fu Yong
School of Mechanical and Production Engineering, Nanyang Technological University, 639798 Singapore
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Hsieh Jang-Hsing
School of Mechanical and Production Engineering, Nanyang Technological University, 639798 Singapore
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Chen Tu
School of Electrical and Electronic Engineering, Nanyang Technological University, 639798 Singapore
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Liu Yang
School of Electrical and Electronic Engineering, Nanyang Technological University, 639798 Singapore
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Fung Steve
Department of Physics, The University of Hong Kong, Hong Kong
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