Low Threshold Current Density InGaN Based 520--530 nm Green Laser Diodes on Semi-Polar $\{20\bar{2}1\}$ Free-Standing GaN Substrates
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概要
- 論文の詳細を見る
Green laser diodes (LDs) on the $\{20\bar{2}1\}$ plane exhibit lower threshold current densities, nearly half of those on the $c$-plane in the green region between 520--530 nm. The threshold current of a typical $\{20\bar{2}1\}$ green LD lasing at 525.5 nm under room temperature cw operation is 51.1 mA, which corresponds to a threshold current density of 4.3 kA/cm2. The threshold voltage is 6.38 V. The characteristics temperature $T_{0}$ is measured to be 175 K. The perpendicular $\theta_{\bot}$ and parallel $\theta_{\|}$ beam divergence angles at half power of the $\{20\bar{2}1\}$ green LDs are 24 and 11°, respectively. From the viewpoint of the device characteristics, especially the threshold current density, we conclude that the green LDs on the $\{20\bar{2}1\}$ plane GaN substrates have the essential advantage for obtaining efficient green LDs.
- 2010-12-25
著者
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Ueno Masaki
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Katayama Koji
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Tokuyama Shinji
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Sumiyoshi Kazuhide
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Nakamura Takao
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Adachi Masahiro
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Enya Yohei
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Kyono Takashi
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Yoshizumi Yusuke
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Ikegami Takatoshi
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Sumitomo Takamichi
Semiconductor Technologies R&d Laboratories Sumitomo Electric Industries Ltd.
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Kyono Takashi
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Takagi Shinpei
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Saga Nobuhiro
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Takagi Shinpei
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Ikegami Takatoshi
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Tokuyama Shinji
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Katayama Koji
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Adachi Masahiro
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Enya Yohei
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Sumiyoshi Kazuhide
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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SAGA Nobuhiro
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd.
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Saga Nobuhiro
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Yoshizumi Yusuke
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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Nakamura Takao
Semiconductor Technologies R&D Laboratories, Sumitomo Electric Industries, Ltd., 1-1-3 Shimaya, Konohana-ku, Osaka 554-0022, Japan
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