Diamond Deposition on a Large-Area Substrate by Plasma-Assisted Chemical Vapor Deposition Using an Antenna-Type Coaxial Microwave Plasma Generator.
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Diamond deposition on a large area silicon wafer substrate (φ 100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the entire substrate. Diamond precursors are emitted radially onto a silicon substrate from the plasma sphere generated at the tip of the antenna. The possibility of diamond deposition outside the plasma sphere is discussed using a semi-empirical equation.
- 公益社団法人 応用物理学会の論文
公益社団法人 応用物理学会 | 論文
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