Systematic Measurement of Critical Current Density for Narrow YBa2Cu3Oy Lines.
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Critical current densities (J<SUB> c</SUB>'s) of submicron YBa<SUB>2</SUB>Cu<SUB>3</SUB>O<SUB> y</SUB> (YBCO) lines were studied. Increase in J<SUB> c</SUB> with reduction of line width (w) was observed reproducibly, when temperature rise of the substrate is suppressed during plasma etching of YBCO. Intermittent etching and liquid-nitrogen cooling were very effective in obtaining sufficient cooling. Temperature dependence of current-voltage characteristics was interpreted in terms of thermally activated vortex motion. This result indicated the existence of a potential barrier to vortex motion. In particular, the surface barrier played an important role in determining J<SUB> c</SUB> in the submicron lines. Furthermore, the dependence of J<SUB> c</SUB> on w was strongly dependent on the current concentration to the edges due to Meissner effect.
- 公益社団法人 応用物理学会の論文
公益社団法人 応用物理学会 | 論文
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