Removal of Fluoride Ion by La (III) - loaded Chelating Resin Having Phosphonomethylamino Groups
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概要
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Adsorption characteristics of La (III) -loaded chelating resin containing phosphono-methylamino groups for fluoride ion and application to the selective removal of fluoride ion have been studied. The adsorption of fluride ion depends on the pH of the solution i. e., the capacity and the adsorption rate increase with decrease of the pH. But when the pH is less than 3.5, gradual leaking of La (III) inevitably takes place. Therefore, pH 3.5 is chosen as the optimal adsorption condition of the solution. Fluoride ion is effectively adsobed on the column packed with La (III) -loaded resin at pH 3.5. No significant interference from Cl<SUP>-</SUP>, NO<SUB>3</SUB><SUP>-</SUP> and SO<SUB>4</SUB><SUP>2-</SUP> were observed. The retained fluoride ion has been released from the column by elution with 1mol⋅dm<SUP>-3</SUP> sodium hydroxide solution without any leakage of the metal ion. The column can be used repeatedly after regeneration.
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