One-pot synthesis of self-sensitizing photopolymer and its photochemical properties.
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概要
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Photosensitive polymer with pendant photosensitive group and photosensitizing group (self-sensitizing photo-polymer) was prepared by radical copolymerization of 2-hydroxyethyl methacrylate with sensitizing monomers such as 4-nitrophenyl methacrylate or 4-nitro-l-naphthyl methacrylate by using 2, 2′-azobisisobutyronitrile in dimethylformamide and the subsequent condensation reaction of the copolymers with cinnamoyl chloride using pyridine as hydrochloride acceptor in the same reaction flask. The copolymers obtained in this method had high molecular weight. These copolymers indicated good solubility in usual solvents, and had excellent thermal stability. In addition, the copolymer containing 4-nitro-l-naphthyl methacrylate units showed excellent photo-chemical reactivity, photosensitivity and high resolving power. These results suggested that the synthesized copolymers had a bright prospect of applying to practical use.
- 公益社団法人 高分子学会の論文
公益社団法人 高分子学会 | 論文
- 情報の入口--高分子センサ-とトランスデュ-サ- (情報化社会と高分子)
- 高分子科学最近の進歩--メルトレオロジ-(伸長粘度)
- 高分子系の相分離--特にポリマ-ブレンドについて
- 導電性高分子の磁気緩和--NMRT-1〓1の周波数依存性
- 多機能性高分子の合成 (化学修飾による多機能性高分子)