Wet Chemical Etching by Oblique stagnation-point flows

概要

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Wet chemical etching (WCE) is used for making shadow masks that have many microscopic holes in a steel sheet. The etching rate is limited by removal of the dissolution products from the vicinity of the active surface. In this paper, we investigate the fluid mechanical aspects and the mass transport phenomena in WCE by an oblique stagnation flow. The flow pattern and the distribution of Sh<SUB>x</SUB> change according to the angle of incidence and the relative location of the stagnation-point to the hole center. Compared with the limiting cases of vertical and horizontal stagnation flows, Sh<SUB>x</SUB> along the active surface becomes small in general. The quasi-stationary shape evolution is investigated and an intermediate behavior is observed compared with the two limiting cases.
社団法人日本流体力学会の論文