Fabrication of Monolayer Particle Arrays by Continuous Coating Process
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概要
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Two or three-dimensional arrays of particles are expected as the structure having novel functions such as light-emitting diodes, solar batteries, and photonic crystals. But the fabrication method of particle array having a large area with high regularity is under development. The objective of this study is to develop the continuous coating process for large area fabrication of the monolayer particle array by convective self assembly (CSA). The formation rate of particle array increased with the flow rate of the feed colloidal suspension, and its regularity became higher than that using the batch type method of CSA. The defects in the particle array prepared by CSA were able to be categorized through point and line defects. The number of point defect in particle array decreased when using the continuous coating process, or the colloid suspension mixed with small particles, or the mechanical vibration in colloid suspension during coating process. On the other hand, the number of line defect in particle array was not changed by these operation conditions.
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