Stress Analysis for Axi-symmetrical Problems by Scattered Light Photoelasticity

概要

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Formerly in the photoelastic experiments, indistinct isoclinic lines had to be applied in order to resolve the stresses in axi-symmetrical problem. The problem of axi-symmetrical stresses can be analyzed by the scattered light photoelasticity. This method need to obtain a stress equilibrium equation and three scattered isochromatic fringe patterns by three different incidences of polarized light beam. For the purpose of checking the accuracy of this experimental method, an author performed the stress analysis of a round shaft with a semi-circular groove under the room-temperature tensile loading, and also an author developed the epoxy resin of a new photoelastic material. This material had almost no initial stress and photoelastic stress sensitivity of this material was higher value. As a result, it was proved that this technique led to a higher accuracy of the experimental stress analysis.
日本実験力学会の論文