Target Erosion Pattern in Planar Magnetron Sputtering
スポンサーリンク
概要
- 論文の詳細を見る
Two methods for visualizing the target erosion pattern in the planar magnetron sputtering system are described here. The experimental results obtained by one of the new methods reveal that there exists a threshold vertical magnetic field corresponding to the erosion pattern boundaries. The effect of the working pressure and of the cathode potential on the erosion pattern is explained in terms of the mean free path and the initial velocity of the secondary electrons, respectively.
- 公益社団法人 応用物理学会の論文
公益社団法人 応用物理学会 | 論文
- Electron Channelling Effect in an Al–Fe–Cu Quasicrystal
- Construction and Performance of a Large-Aperture Wire-Chamber Spectrometer for Pion Scattering Experiments at KEK
- Effect of Plasma Injection on Cold Wall Type MHD Generator
- Development of Scanning μ-RHEED Microscopy for Imaging Polycrystal Grain Structure in LSI
- Boundary Layer Cooling Effect on Semi-Hot Wall Type MHD Channel