沿面放電プラズマ応用電子ビームにより蒸着された硬質炭素膜に関する研究:—新しい硬質炭素膜の作成—

概要

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We have been studying the Pulsed Plasma Deposition (PPD) technique for applying Diamond-Like Carbon film deposition. This technique is one of the applications of the surface discharge, and the deposition process is based on an ablation. In this technique, pulsed electron and plasma beams irradiate the target through the discharge tube and make plume on the target. Ablated particles from the target are deposited as the thin films on the substrate. Until now, this technique has not yet been applied to produce the DLC film. We have tried to apply this technique without using an intermediate layer of a metal thin films and without heating the substrate to grow the DLC films with higher hardness and quality. As a result, when the discharge voltage has been applying at -13kV, hardness of deposited the DLC films was measured to be about 90GPa, sp3-contents of the DLC films was measured to be 80% by NEXAFS, surface of the DLC films was observed to be smooth by FE-SEM and adhesion to the substrate was about 80N. We conclude from the above results that the PPD technique can be one of the superior technique for producing DLC films with high hardness, smooth surface and high adhesion.
公益社団法人精密工学会の論文