Photoexcited Carrier Transfer in a NiSi-Nanodots/Si-Quantum- Dots Hybrid Floating Gate in MOS Structures

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概要

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• We have fabricated MOS capacitors with a hybrid floating gate (FG) consisting of Ni silicide nanodots (NiSi-NDs) and silicon-quantum-dots (Si-QDs) and studied electron transfer characteristics in the hybrid FG structures induced by the irradiation of 1310nm light. The flat-band voltage shift due to the charging of the hybrid FG under light irradiation was lower than that in the dark. The observed optical response can be attributed to the shift of the charge centroid in the hybrid FG caused by the photoexcitation of electrons in NiSi-NDs and their transfer to Si-QDs. The photoexcited electron transfer from the NiSi-NDs to the Si-QDs in response to pulsed gate voltages was also evaluated from the increase in transient current caused by the light irradiation. The amount of transferred charge is likely to increase in proportion to pulse gate voltage.

著者

• Makihara Katsunori

  Graduate School of Advanced Science and Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan

• Ikeda Mitsuhisa

  Graduate School of Advanced Science and Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan

• Miyazaki Seiichi

  Graduate School of Advanced Science and Matter, Hiroshima University, Higashihiroshima, Hiroshima 739-8530, Japan

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