High-Frequency Precise Characterization of Intrinsic FinFET Channel
スポンサーリンク
概要
- 論文の詳細を見る
This paper presents a precise characterization of high-frequency characteristics of intrinsic channel of FinFET. For the de-embedding of the parasitics attached to the source, drain and gate terminals, it proposes special calibration patterns which can place the reference surface just beside the intrinsic part of the FinFET. It compares the measured S parameter data up to 40GHz with the device simulation and shows good matching. The experimental data of the through pattern also confirms the accuracy of the de-embedded parasitics and extracted intrinsic part of FinFET.
著者
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Ishikuro Hiroki
Keio Univ. Yokohama‐shi Jpn
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Sakai Hideo
Keio University
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MATSUKAWA Takashi
AIST
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ENDO Kazuhiko
AIST
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LIU Yongxun
AIST
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TSUKADA Junichi
AIST
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ISHIKAWA Yuki
AIST
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NAKAGAWA Tadashi
AIST
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SEKIGAWA Toshihiro
AIST
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KOIKE Hanpei
AIST
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SAKAMOTO Kunihiro
AIST
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MASAHARA Meishoku
AIST
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