The Thermal Behavior of Silanol Groups of Silica Gel as Studied by Infrared Spectroscopy. I

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概要

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• The thermal behavior of the silanol of silica gel has been studied by quantitative infrared spectroscopy. Transparent and glass-like plates of silica gel of high purity, after they had been heat-treated at various temperatures below 680 °C, were used for the measurement of OH stretching vibrations ranging from 3100 to 3800 cm<SUP>−1</SUP>. These absorption bands were analysed into the several component bands by the simulation method using a Dupont Co. Curve Resolver. The intensity of these bands in area were proportional to the OH concentrations as measured by the thermal method. Each component band disappeared at a temperature which was roughly equal to that obtained from the dielectric and conductivity measurements. From these results, assignment was attempted on the basis of these bands.

• 公益社団法人 日本化学会の論文

著者

• Fujii Kenzo

  Osaka University of Education

• Kondo Seiichi

  Osaka University of Education

• Muroya Masa-aki

  Osaka Electrocommunication University

• Muroya Masa-aki

  Osaka Electro-Communication University

関連論文

• The Thermal Behavior of Silanol Groups of Silica Gel as Studied by Infrared Spectroscopy. I
• The Effect of Impurities upon the Physical Properties of Silica Gel by the Heat-Treatment
• The Direct-current Conductivity of Silica Gel
• The Dehydration of Surface Silanol on Silica Gel
• The Dielectric Relaxation of γ-Alumina

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