Energy Distribution of Secondary Electrons from Copper-Beryllium Alloy by Positive Ions of Inert Gases. I. Electro-polished Surface
スポンサーリンク
概要
- 論文の詳細を見る
The distribution curves of the kinetic energies of the secondary electrons from the electropolished copper-beryllium surface by inert gas ions were measured by the retarding potential method together with the yield of the secondary electron emission. The contact potential difference between the ion target (electro-polished copper-beryllium) and the electron collector (gold) was also measured by the retarding potential method for the thermal electrons from tungsten, and the correction of this contact potential difference was made for the kinetic energies of secondary electrons. The main results obtained are as follows.<BR>(1) The contact potential difference between gold and electro-polished copper-beryllium(4%) is 0.95 eV. (gold, negative).<BR>(2) The general features of the distribution curves of secondary electrons are similar to the distribution curves of the kinetic ejection measured by Waters.<BR>(3) The present results of the energy distribution curves of secondary electrons by the inert gas ions indicate that the yield of secondary electrons is increased by increasing the kinetic energy of the primary ions, and that this increment in the yield is mainly contributed from the secondary electrons which have lower kinetic energies than that of the secondary electrons emitted by the incident ions of low kinetic energies. These phenomena are able to be postulated qualitatively by the idea of sternglass.<BR>(4) The total number of emitted electrons is increased with the increase in the value of the ionization potential of incident ions, and the kinetic energies of emitted electrons become greater by increasing the potential energy of incident ions. These phenomena are difficult to explain by the mechanism of the kinetic ejection, therefore the electron emission from the electro-polished copper-beryllium surface by inert gas ions may occur according to the complicated mechanism in which the potential energies of incident ions contribute to the electron emission together with their kinetic energies.<BR>(5) In contrast with the singly-charged ions, the doubly-charged ions give rise to the broadening of the energy distribution curves. This also suggests the occurrence of the comlicated ejection mechanisms.
- 社団法人 日本化学会の論文
著者
-
SUGIURA T.
Department of Surgery, Chiba University School of Medicine
-
Sugiura Toshio
Department of Applied Chemistry Faculty of Engineering University of Osaka Prefecture
関連論文
- N-3 vs N-6 POLYUNSATURATED FATTY ACIDS (PUFA) IN CRITICAL ILLNESS
- Application of H2 Control for Evaluating the Ion Channel Gating on Excitable Cellular Membranes
- Potential Distribution Analysis around DNA as a Micro Bio Machine
- Energy Distribution of Secondary Electrons from Copper-Beryllium Alloy by Positive Ions of Inert Gases. I. Electro-polished Surface
- The Secondary-emission Electron Multiplier Tube Used on a Mass Spectrometer and its Amplification of Ion Currents
- Secondary Electron Emission from Copper-Beryllium (4%) Surface by Bombardment of Various Positive Ions
- Energy Distribution of Secondary Electrons from Copper-Beryllium Alloy by Bombardment of Positive Ions of Inert Gases. II. Activated Copper-Beryllium