多重エネルギーB+イオン注入によるTi-C-N膜の結晶構造変化

概要

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Boron ions were implanted in Ti-C-N coatings by using a multienergy technique, and the effect of the implantation on the crystal structures and microhardness of the Ti-C-N coatings were studied. A SIMS analysis showed a uniform concentration of boron atoms in the coatings at depths from 0.05μm to 0.33μm due to the multienergy implantation, which was in good agreement with calculated results. As the boron concentration is increased, the lattice parameter of Ti-C-N increases in value and the broadening of the X-ray diffraction peak becomes observable. This suggests that Ti-C-N is amorphized. The formation of borides such as TiB2 and BN was not found. It was assumed that boron atoms were implanted interstitially in the lattice and partially expanded interplanar spacing. Internal stresses caused by the foreign boron atoms in the Ti-C-N lattice could induce the lattice to become rearranged. The microhardness of the Ti-C-N coatings was decreased by this implantation of boron atoms.
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