高性能角度分解X線光電子分光装置による光電子回折効果の測定

概要

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The angle-restricting aperture and the precise two-axis-rotation sample manipulator are added-on to the high-performance multichannel X-ray photoelectron spectrometer to set up the high performance angle-resolved X-ray photoelectron spectrometer. Obtained precisions of angular control are within 0.1° along off-plane (θ), and within 1 along on-plane (∅) sample rotations. Angular resolutions of the aperture, in terms of the step response, are designed as 4.2° along θ and 6.4° along ∅. Polar, azimuthal and two-dimensional XPED patterns for As3d and Ga3d photoelectrons from GaAs (001) surface are measured with the instrument. Observed XPED patterns show clear correspondence with crystal structure of GaAs, and the slopes of intensity distributions in XPED patterns indicate that expected angular resolution along ∅ and better resolution along θ are realized on the instrument.
社団法人日本分光学会の論文