Formation Mechanism of Dense High-Speed Plasma Flow in Tapered Capillary Discharge
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概要
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We propose a new type of plasma source using a pinch discharge in a tapered capillary, which generates a dense moving plasma by electromagnetic compression and acceleration. The axial velocity and flux of the moving plasma are controllable and can be maximized by adjusting the taper angle. The behavior can be illustrated with a simple model considering the pinching dynamics of the current sheet.
著者
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Nakajima Mitsuo
Department Of Energy Sciences Interdisciplinary Graduate School Of Science And Engineering Tokyo Ins
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Horioka Kazuhiko
Department Of Energy Sciences Interdisciplinary Graduate School At Suzukakedai Tokyo Institute Of Te
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KAWAMURA Tohru
Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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ADACHI Koichiro
Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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NAKAJIMA Mitsuo
Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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