真空アーク蒸着法によるTiN膜の特性

概要

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Titanium nitride films were deposited on High Speed Steel substrates at various bias voltage (0-400) as one of the process parameters by vacuumarc deposition process, and the effects of vias voltage on their cutting life, crystal structure, composition, surface morphology, adhesion and residual stress were investigated. The cutting life of TiN coated drill showed maximum value, when bias voltage was the range of -200-400 V.<BR>The crystal orientation of deposited TiN film at low bias voltage (0-50 V) showed the strong (220) peak, whereas at high bias voltage (-100-400 V) showed the strong (111) peak. The composition ratio (N/Ti) of TiN film analyzed by X.P.S was in the rage of 0.950.98 and essentially independent of bias voltage. The micro hardness, adhesion and compressive residual stress of TiN film increased with increasing bias voltage and their maximum values were obtained at -200 V bias voltage.
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