室温排気の試験容器における極高真空の発生 (極高真空シンポジュ-ムプロシ-ディングス)

概要

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Achevement of extreme high vacuum (XHV) without any baking in a short time is one of desirable points in development of XHV technology. Electrochemical buffing to improve properties of a vacuum surface was applied to a test chamber made of stainless steel and surfaces both treated and untreated by this technique was studied by secondary ion mass spectrometry (SIMS). SIMS depth profiling of most elements related to outgassing for two different surfaces showed tremendous reduction of hydrogen, carbon, oxygen and sulfur in the order of 100 to 1000. The test chamber was pumped by turbo molecular pump and titanium sublimation pump in different modes. It turned out that XHV in the order of 10-9Pa can be achieved within 24 h without any baking of the whole vacuum system after N2 exposure and even after air exposure. Afterwards, the vacuum system was modified to measure outgassing rates by through-put method. The result showed an outgassing rate in the order of 10-8 to 10-9Pam3/sm2 for 24 h pumping without baking. The outgassing rate was found to be similar to an outgassing rate being obtained for a conventionally treated stainless steel surface after baking.
日本真空協会の論文