固体質量分析とイオン顕微鏡

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概要

• 論文の詳細を見る

• Mass spectometric techniques for the analysis of trace components in solids have been developed since it has been needed for the microfablication of semiconductor devices. SSMS (Spark Source Mass Spectrometry) has been first applied for the bulk analysis of Si and Ge, and contributed to the development of transistors through the analysis of materials. As semiconductor devices have been microminiaturized into IC, SIMS (Secondary Ion Mass Spectrometry) has been developed and image analysis of SIMS (Scanning type or Ion Microscopic type) has been also advanced.LIMS (Laser Ionization Mass Spectrometry) and Micro beam SIMS have been developed for the loacal analysis. GDMS (Glow Discharge Mass Spectrometry) has also been developed. The ion emission from GDMS ion source is more stable than that from spark ion source.Sasaki and his group have done pioneering works on ion microscope. This paper describes them and reviews of mass spectrometric techniques in solids.

• 日本質量分析学会の論文

著者

• 吉岡 芳明

  松下テクノリサーチ

• 草尾 健司

  松下テクノリサーチ

• 小西 文弥

  松下テクノリサーチ

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