イオン照射でスパッタされた原子の角度分布測定
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概要
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The apparatus for measuring angular distributions of atoms sputtered from metals by ion bomberding has been constructed. It has a hollow cathode type ion source, an ion beam focusing system and a target chamber in which a target and collectors of sputtered atoms are set. The angular distributions of the sputtered atoms have been measured using inert gas, copper and silver ions and two metals. A rotating target is used to collect quantitative amounts of atoms for atomic absorption analyses on collectors with a possibly low ion dose, since a high ion dose erodes topographically a target surface probably to affect the angular distributions. It has been observed that the atoms sputtered in the opposite direction to an ion beam incidence decease as the ion dose becomes high and mass ratio of the ion to the target atom increases.
- 九州大学大学院総合理工学研究科の論文
- 1981-12-30
九州大学大学院総合理工学研究科 | 論文
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