大強度パルスイオンビーム蒸着法によるBaTiO3薄膜の生成
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概要
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Cubic barium titanate (BaTiO\_3_) thin films have successfully been prepared \!in situ! on the substrates of glass and Si (100) by intense, pulsed, ion-beam evaporation technique without heating the substrate. The energy of the ion beam used was typically ~ 1 MeV with the power density of ~ 7 GW/cm\^2^. The deposition rate was observed to be ~ 0.1 \mu\m/shot on Si. The films were cubic polycrystals. The specific dielectric constant was found to be 33 ~ 50
- 長岡技術科学大学の論文