Deposition of transparent conducting Al-doped ZnO thin films by ICP-assisted sputtering

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2010 IEEE Region 10 Conference (TENCON 2010) : Fukuoka, 2010.11.21-2010.11.24Aluminum-doped zinc oxide (AZO) is one of the promising transparent conductive oxide materials, which is expected to be an alternative to tin-doped indium oxide (ITO) that for long has been widely used in industry. The authors have been engaged in the development of AZO deposition process using inductively-coupled plasma assisted sputtering in a couple of years. This paper reports the results showing effectiveness of inductively coupled plasma (ICP) assisted sputtering in AZO film deposition process.