133 Paの酸素, 水素, エチレンに接触させたCsおよびRe添加Ag触媒表面のXPS分析

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Self-supporting Cs and/or Re-Ag catalyst disc surfaces, which were exposed to oxygen, hydrogen,ethylene and a mixture of ethylene and oxygen at 133 Pa and 483 K in a pretreatment chamber, weremeasured by XPS. The oxidation states and surface layer concentrations of Cs and Re on the CsRe-Ag disc changed largely with exposing to oxygen and hydrogen, while, in exposing to ethylene andthe mixture of ethylene and oxygen, their parameters were almost unchangeable. O1s spectra withlarge fwhm of 3.2-4.2 eV were deconvoluted into five kinds of oxygen species, of which the compositionvaried with exposing to oxygen and hydrogen and also with exposure time. The resultsdescribed above were compared with those on Cs-Ag and Re-Ag and discussed.