高周波放電水素プラズマによるニッケル表面の不純物の変化とプラズマ駆動透過に及ぼす表面不純物の影響

概要

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Modification of surface impurities on nickel membrane exposed to rf-discharged hydrogen plasma at room temperature and 500℃ was examined with Auger electron spectroscopy. The main impurities were oxygen, carbon, and sulfur. Their concentration was reduced with exposure to the hydrogen plasma. At room temperature, sulfur was completely removed but carbon formed nickel carbide. At 500℃, sulfur and carbon were completely removed. At every temperature, oxygen was not completely removed on the contrary oxygen and silicon were deposited on the surface in case of exposure for long time, which was ascribed to the sputtering of pyrex glass. These results were related to our previous experiment of the plasma-driven permeation of hydrogen through nickel and the influence of the surface impurities on the transient behavior of the plasma-driven permeation was discussed.
九州大学大学院総合理工学研究科,Interdisciplinary Graduate School of Engineering Sciences, Kyushu Universityの論文
1991-09-01