電気化学的手法によるナノ多層膜の作製と構造解析

概要

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Multilayer films recently have become of special interest for functional films in the industrial materials. The thin multilayer films prepared from crystalline and amorphous have scarcely been studied. In this paper,structural analysis of nickel-phosphorus nano multilayer films are investigated.The content of phosphorus of the nickel deposits was influenced by the current density or deposition potential,and it was relatively high in the low current density or noble deposition potential. Crystalline and amorphous nickel-phosphorus films was alternately deposited with high current density of 200mA cm-2 and low current density of 5 mA cm-2,respectively. The nano structure of multilayer films was analyzed by means of a SEM,XRD,AES and XPS. The hardness of multilayer films was increased to 760Hv with a decreasing of one layer thickness,while,grain size of crystalline Ni-P of the multilayer films was shown to be decreased 11nm. The high hardness of multilayer films may be related to the reduced grain size of the crystalline nickel-phosphorus.